Dual Output Matcher

Dual-output matchers are widely used in semiconductor equipment such as etching and thin film deposition. They match the impedance between the RF power supply and the reaction chamber in plasma equipment, maximizing RF power transmission to the reaction chamber.

Advantages

Fully automated current proportional control

The current signal is monitored in real-time by the current sensor at the output end. The controller achieves automatic adjustment and rapid response of the current ratio according to customer requirements.

Wide range current ratio application window

Achieve a range adjustment of 0.1-10 for the ratio of inner and outer coil currents, significantly improving process uniformity.

Wide range current ratio application window

Suitable for various process applications in etching equipment, it can meet the needs of high-speed plasma ignition and impedance matching, especially achieving fast matching in Bosch processes to meet the demands of high aspect ratio etching.

Innovation

Real-time current proportional control algorithm

A type of automatic current ratio control algorithm that uses a current sensor at the output end to monitor the current signal in real time. Through the control algorithm, it automatically adjusts to achieve the target value of the current ratio on the inner and outer coils.

High-current output sensor technology

For high-voltage, high-current output signals, it can achieve a wide range of current signal sampling and accurate measurement, used in high-end processes for uniformity adjustment algorithm applications.

High-speed plasma ignition algorithm

The specially optimized algorithm is suitable for various process applications in etching equipment, and can meet the needs of high-speed plasma ignition and impedance matching, especially achieving fast matching in Bosch processes to meet the requirements of high aspect ratio etching.

Application areas

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

Technical indicators

Power Range

10W-5kW

Frequency Range

13.56MHz±5%

Matching Speed

≤1s (Suitable Preset) or 3s

Matching Accuracy

≤1%* Forward Power or 5W

Signal Type

Continuous Wave, Pulse Wave (SLP/DLP/MLP)

Communication Interface

RS232/EtherCAT

Supply Voltage

24V DC

Cooling Type

Forced Air Cooling

Impedance Range

Customized according to customer needs

Mechanical Dimensions

Customized according to customer needs

Interface Type

Customized according to customer needs

Application Products

Etch

Related Products

Contact Us

If you have any questions, please leave your detailed requirements information here, and we will be happy to serve you.

Contact Us
Security verification
Privacy Statement
Submit
%{tishi_zhanwei}%