FV100 Vaporizer

The FV100 vaporizer is a device that atomizes a precursor liquid into a droplet aerosol, which then flows into a high-efficiency heat exchanger to form steam. It provides a high-purity gas or vapor mixture that is essentially free of particulate contaminants, used in CVD, PECVD, and ALD thin film deposition for semiconductor thin film deposition and industrial coating applications.

Advantages

Low weight, small size

The product weighs only 1.3kg, with a maximum height of 177mm and a maximum width of 56mm, allowing for installation in confined spaces and saving machine space.

High vaporization efficiency

It can achieve 100% vaporization efficiency and can stably and efficiently output gas.

Device maintenance-free

The clever structural design reduces later maintenance costs.

Customizable

Applicable to various process precursors (TEOS/TEPO/TEB/H20 .etc.), the vaporizer can be customized according to customer's different flow and temperature requirements.

Innovation

High vaporization efficiency

Can achieve 100% vaporization efficiency and stable and efficient gas output.

Save space

The product is up to 177mm high and 56mm wide at its widest point.

Semiconductor-Integrated Circuit

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Model

FV100

Type

Dimensions

mm×mm×mm

Size

Weight

1.3kg

Weight

Connector

Inlet: 1/4”VCR; Liquid inlet: 1/8”VCR×2;Outlet: 1/2”VCR

Joint

Material

316L

Material

Leak Rate

<1×10-8 scc/sec Helium

Leak Rate

Heater Specifications

208 VAC, 60Hz, 400W

Heater

Carrier Gas

Inert Gas

Carrier gas

Liquid Flow Range

0-10g/min(TEOS)

Flow Range

Maximum System Pressure

1.0MPa

Position resolution

Temperature Sensor Type

Type K Thermocouple

Temperature Sensor

Installation Position

any

Mounting Position

Maximum Pressure Resistance

1.0 Mpa

Pressure Resistance

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