Equipped with a 5000-line photoelectric encoder, achieving a position resolution of up to 12,800 (within a 90° range).

Supports process data memory and inter-device data transfer, ensuring stable process performance and adaptability to diverse application scenarios.

The pressure control accuracy can reach 0.1% S.P., and the fluctuation of butterfly valve opening during stable operation is less than 1% S.P.

The product supports customization of valve body materials, adjustable plate clearances, and multiple standard mechanical interfaces, with expandable SPS and PFO functional capabilities.

Supports dual vacuum gauge signal acquisition, provides ±15V or +24V power supply to the vacuum gauges, and can automatically switch measurement ranges based on process requirements.

The pressure control unit records the relationship between pressure and valve opening in the process env bination of position, speed, and pressure three loops. At the same time, it dynamically calculates the pressure to pressure ratio, position to pressure ratio, target pressure position, and estimated time to reach the target pressure, thereby actively intervening in the changes in valve opening and achieving fast and stable pressure control.

Adopting a customized servo control on-board system and using a multi-point slope control algorithm, the butterfly plate can be positioned faster, with opening or closing time up to 0.􏚳sec.