300mm (nitrogen) wafer cassette transport and storage system
Advantages
Nitrogen purge
Multi-position storage
Full process particle control
Strong compatibility
Innovation
High automation efficiency
Fully sealed FIMS
N 2 Purge system
Application areas
Semiconductor Integrated Circuit
Semiconductor—Advanced Packaging
Semiconductor display
Power semiconductor
Compound semiconductor
Photovoltaic
Technical indicators
Vibration Value | ≤0.3g |
Particle Index | <10ea@0.02μm, <3ea@0.5μm |
Shelf Nitrogen Purge |
At a flow rate of 15L/min, the oxygen concentration inside the FOUP box stored on the Shelf is reduced to ≤1%, and the humidity is reduced to ≤10% within 5 minutes. |
FIMS Nitrogen Purge | At a flow rate of 80L/min, the oxygen concentration inside the FOUP is reduced to ≤50ppm within 4 minutes. |
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