Grail B1203A Wafer Transfer System
The Grail B1203A wafer transfer system achieves wafer box (Foup) input and output through interaction with the customer's overhead hoist (OHT) system. It realizes inter-process stage transfer, conveyance, and storage of Foups through a FOUP robotic arm. Internal loadports enable Foup opening and mapping. The wafer transfer, merging, and splitting are accomplished through the wafer transfer system (WTS). Wafer status confirmation and data comparison are achieved through mapping at three locations. 50P wafer caching is realized through a fixed buffer (BF). Interfacing with the cleaning process robot is handled through a pan-tilt-zoom (PTZ) system. The top electrostatic field unit (EFU) maintains a cleanroom environment within the machine, and the top ion bars remove electrostatic residue from the transfer path.
Advantages
Strong compatibility
Applicable to wafer transfer systems of 150mm, 200mm, and 300mm.
Multiple transmission methods
Reliable transfer and storage of wafers from CST, Pod, and Foup to the process area is implemented, with both Cassette and Cassette-less types available.
Multiple modes
The equipment is used in the cleaning process, upstream and downstream of the cleaning machine, providing dirty wafers to the cleaning machine and recovering clean wafers after cleaning, and storing dirty, clean, and empty FOUPs.
Crane system interaction
Features interaction with client OHT system for FOUP handling, including FOUP transfer and storage, as well as wafer sorting, combining, and scanning functionalities.
Innovation
Multiple loading and unloading modes
It can be connected to a variety of loading and unloading methods, including manual, MGV, AGV, SMIF, and OHT.
High cleanliness level
The transmission area can meet the cleanliness level of Class 1.
Multiple functional options
Functional options can be provided for different process machines, such as Stocker, Buffer, Mapping, Aligner, etc.
High production capacity
Capacity can reach 650WPH.
International Certification
Has obtained professional certifications such as SEMI S2, F47, CE, and UL.
Application areas
Semiconductor Integrated Circuit
Semiconductor—Advanced Packaging
Power semiconductor
Compound semiconductor
Low Particulate Generation | PA add≤5ea@28nm |
High Reliability | Failure Rate ≤50 ppm |
High Capacity | WPH≥700 |
Dual Process Paths | Realization of independent path distinction before and after single-channel process |
Scanning | Real-time Mapping throughout the entire process, Lot information data comparison |
Close-fitting Method | Double 25 Batch |
Defect Identification | Wafer interaction anomaly detection |
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