• Fluid Control Products

    Fluid Control Products
    Fluid control utilizes various control modules to accurately control key specifications such as fluid flow, pressure and vacuum to meet the specific process needs in the industrial field. With more than 40-Year development on the field of fluid control, AURASKY has developed a series of products such as gas mass flow controllers, pressure controllers,capacitive diaphragm gauges, vacuum switches, pressure sensors, differential pressure pauges, liquid pressure transducers, mixing vaporizers and gas panels. These products play a vital role in many fields such as IC, photovoltaics, vacuum coating and scientific research.

    • Gas Flow Measurement & Control

      Gas Flow Measurement & Control
      Gas Mass Flow Controller (MFC) is a device used for precise measurement and control of gas flow. Since developing its first analog gas mass flow controller in 1979, AURASKY has continuously iterated and innovated, optimizing performance to successively launch thermal based digital gas mass flow controllers and pressure based digital gas mass flow controllers. These products offer advantages such as high precision, high reliability, low zero drift, corrosion resistance and rapid response. Currently, the product range encompasses over 100 types, making them one of the indispensable core components in high-end manufacturing fields.

    • Vacuum Measurement & Control

      Vacuum Measurement & Control
      AURASKY based on its advanced R&D experience in gas mass flow controllers,has continuously expanded its product portfolio to include precision control components such as gas pressure controllers, capacitive diaphragm gauges, pressure transmitters, vacuum pressure switches, butterfly valves, and pendulum valves. These products feature high accuracy, high stability, fast response, and high repeatability, providing stable pressure control solutions for high-end manufacturing fields to ensure process stability and consistency.

    • Liquid Flow Measurement & Control

      Liquid Flow Measurement & Control
      AURASKY offers a comprehensive range of liquid control products, covering liquid pressure measurement, flow rate monitoring, and liquid level sensing. Our portfolio includes liquid pressure transducer,liquid heaters, liquid flow controllers, mixing vaporizer, and steam filters. Boasting high accuracy, exceptional stability, rapid response, and excellent repeatability, these solutions deliver reliable liquid control for the high-end integrated circuit industry.

    • Gas Panel

      Gas Panel
      Gas Mass Flow Controller (MFC) is a device used for precise measurement and control of gas flow. Since developing its first analog gas mass flow controller in 1979, AURASKY has continuously iterated and innovated, optimizing performance to successively launch thermal based digital gas mass flow controllers and pressure based digital gas mass flow controllers. These products offer advantages such as high precision, high reliability, low zero drift, corrosion resistance and rapid response. Currently, the product range encompasses over 100 types, making them one of the indispensable core components in high-end manufacturing fields.

  • RF Control Products

    RF Control Products
    Plasma control is typically achieved by adjusting the type and concentration of the activating gas, and controlling the radio frequency power and gas pressure to precisely control plasma parameters, including plasma density, temperature, and composition. Huacheng Electronics has devoted itself to the research of plasma control, and has mastered ICP (Inductively Coupled Plasma) and CCP (Capacitively Coupled Plasma) technologies. Currently, the mass production of pulse radio frequency power supplies has been achieved, and multiple single-frequency/dual-frequency digital matchers have successfully passed 14nm production line verification and achieved mass production. ESC DC power supplies have been successfully applied in etching and thin film deposition equipment in the integrated circuit field.

    • RF Generator

      RF Generator
      The RF Generator is a power supply device capable of generating sinusoidal waves at specific frequencies. Its core function involves converting facility-level electrical energy into high-frequency electrical energy through integrated circuit systems, including DC power supply units, RF power units, measurement modules, control modules, and communication interfaces. The output power and frequency can be accurately controlled.

    • Match

      Match
      The Match is designed to align the impedance between the RF Generator and the plasma chamber, ensuring maximum RF power transfer to the chamber. It can be customized for specific application scenarios, delivering rapid, accurate, and stable impedance matching across Variable frequencies and power ranges.

    • DC / LF Power Supply

      DC / LF Power Supply
      The DC/LF Power Supply is a device that converts alternating current (AC) or other forms of energy into direct current (DC) or low-frequency (LF) electrical energy through energy conversion mechanisms. The ESC DC Power Supply is a high-voltage product specifically designed for semiconductor applications. It is compatible with unipolar/bipolar and Coulomb-type/- JR-type electrostatic chucks (ESC), providing a stable electrostatic field for wafer adsorption. The RPS (Remote Plasma Source) is a high-stability, low-frequency power supply dedicated to semiconductor applications. It is widely used in cleaning process equipment for oxides, nitrides, and other materials, ensuring reliable plasma stability during critical manufacturing steps.

  • Wafer Transfer Products

    Wafer Transfer Products
    Motion control achieves reliable wafer transfer and storage through an intelligent motion control system. High yield control is realized through excellent capacity management, particle control, vibration suppression, and motion path planning technologies. AURASKY's R&D and manufactured wafer transfer products achieve stable atmospheric and vacuum transfer control for single wafers and batches. Currently, the wafer cassette transfer and storage systems, wafer transfer systems, front-end equipment modules, and wafer transfer platforms developed and manufactured have achieved mass production and delivery at multiple clients in the semiconductor and related industries.

    • Wafer box transfer and storage system Stocker

      Wafer box transfer and storage system Stocker
      The stocker equipment for wafer box transfer and storage system is mainly used in the semiconductor field, acting as a buffer for wafer boxes (FOUP) in the vertical furnace production process. The stocker equipment effectively solves the problem of mismatched supply and cycle time between the vertical furnace process and upstream and downstream processes, and it also realizes the fully automatic opening and closing function of wafer boxes (FOUP), avoiding the impact of manual intervention, ensuring the clean environment of the vertical furnace production process, and improving product quality.

    • Wafer Transfer System (WTS)

      Wafer Transfer System (WTS)
      The system interacts with the customer's OHT system to achieve Foup input and output, uses a FOUP robotic arm to transfer and store Foups between different process stages, uses an internal Loadport to open and map Foups, uses WTS to transfer, combine, and separate wafers, uses mapping at three locations to confirm wafer status and compare data, uses a fixed BF to buffer 50P wafers, and uses PTZ to hand off to the cleaning robot. The top EFU maintains a micro-clean environment for the equipment, and the top ion bar removes electrostatic residue from the transport path.

    • Equipment Front-End Module (EFEM)

      Equipment Front-End Module (EFEM)
      EFEM stands for Equipment Front End Module. EFEM equipment seamlessly connects with various semiconductor process equipment (etching, PVD, CVD, cleaning equipment, etc.), ensuring automated wafer transfer and efficient wafer management in a clean environment. EFEM equipment has multiple interlocks to ensure the safety of personnel and equipment during wafer transfer.

    • Wafer Transfer Module (WTM)

      Wafer Transfer Module (WTM)
      Wafer transfer platforms are an indispensable part of semiconductor process equipment. They primarily automate wafer transfer between different modules in cleanroom and vacuum environments. These platforms can quickly switch between atmospheric and vacuum states to meet system process requirements. This equipment is typically customized to meet customer process needs.
  • Fluid Control Products
    Fluid Control Products
    Fluid control utilizes various control modules to accurately control key specifications such as fluid flow, pressure and vacuum to meet the specific process needs in the industrial field. With more than 40-Year development on the field of fluid control, AURASKY has developed a series of products such as gas mass flow controllers, pressure controllers,capacitive diaphragm gauges, vacuum switches, pressure sensors, differential pressure pauges, liquid pressure transducers, mixing vaporizers and gas panels. These products play a vital role in many fields such as IC, photovoltaics, vacuum coating and scientific research.
    • Gas Flow Measurement & Control
      流量测控.png
      Gas Flow Measurement & Control
      Gas Mass Flow Controller (MFC) is a device used for precise measurement and control of gas flow. Since developing its first analog gas mass flow controller in 1979, AURASKY has continuously iterated and innovated, optimizing performance to successively launch thermal based digital gas mass flow controllers and pressure based digital gas mass flow controllers. These products offer advantages such as high precision, high reliability, low zero drift, corrosion resistance and rapid response. Currently, the product range encompasses over 100 types, making them one of the indispensable core components in high-end manufacturing fields.
    • Vacuum Measurement & Control
      压力.png
      Vacuum Measurement & Control
      AURASKY based on its advanced R&D experience in gas mass flow controllers,has continuously expanded its product portfolio to include precision control components such as gas pressure controllers, capacitive diaphragm gauges, pressure transmitters, vacuum pressure switches, butterfly valves, and pendulum valves. These products feature high accuracy, high stability, fast response, and high repeatability, providing stable pressure control solutions for high-end manufacturing fields to ensure process stability and consistency.
    • Liquid Flow Measurement & Control
      液体测控.png
      Liquid Flow Measurement & Control
      AURASKY offers a comprehensive range of liquid control products, covering liquid pressure measurement, flow rate monitoring, and liquid level sensing. Our portfolio includes liquid pressure transducer,liquid heaters, liquid flow controllers, mixing vaporizer, and steam filters. Boasting high accuracy, exceptional stability, rapid response, and excellent repeatability, these solutions deliver reliable liquid control for the high-end integrated circuit industry.
    • Gas Panel
      气路系统.png
      Gas Panel
      Gas Mass Flow Controller (MFC) is a device used for precise measurement and control of gas flow. Since developing its first analog gas mass flow controller in 1979, AURASKY has continuously iterated and innovated, optimizing performance to successively launch thermal based digital gas mass flow controllers and pressure based digital gas mass flow controllers. These products offer advantages such as high precision, high reliability, low zero drift, corrosion resistance and rapid response. Currently, the product range encompasses over 100 types, making them one of the indispensable core components in high-end manufacturing fields.
  • RF Control Products
    RF Control Products
    Plasma control is typically achieved by adjusting the type and concentration of the activating gas, and controlling the radio frequency power and gas pressure to precisely control plasma parameters, including plasma density, temperature, and composition. Huacheng Electronics has devoted itself to the research of plasma control, and has mastered ICP (Inductively Coupled Plasma) and CCP (Capacitively Coupled Plasma) technologies. Currently, the mass production of pulse radio frequency power supplies has been achieved, and multiple single-frequency/dual-frequency digital matchers have successfully passed 14nm production line verification and achieved mass production. ESC DC power supplies have been successfully applied in etching and thin film deposition equipment in the integrated circuit field.
    • RF Generator
      射频电源.png
      RF Generator
      The RF Generator is a power supply device capable of generating sinusoidal waves at specific frequencies. Its core function involves converting facility-level electrical energy into high-frequency electrical energy through integrated circuit systems, including DC power supply units, RF power units, measurement modules, control modules, and communication interfaces. The output power and frequency can be accurately controlled.
    • Match
      匹配器.png
      Match
      The Match is designed to align the impedance between the RF Generator and the plasma chamber, ensuring maximum RF power transfer to the chamber. It can be customized for specific application scenarios, delivering rapid, accurate, and stable impedance matching across Variable frequencies and power ranges.
    • DC / LF Power Supply
      直流电源.png
      DC / LF Power Supply
      The DC/LF Power Supply is a device that converts alternating current (AC) or other forms of energy into direct current (DC) or low-frequency (LF) electrical energy through energy conversion mechanisms. The ESC DC Power Supply is a high-voltage product specifically designed for semiconductor applications. It is compatible with unipolar/bipolar and Coulomb-type/- JR-type electrostatic chucks (ESC), providing a stable electrostatic field for wafer adsorption. The RPS (Remote Plasma Source) is a high-stability, low-frequency power supply dedicated to semiconductor applications. It is widely used in cleaning process equipment for oxides, nitrides, and other materials, ensuring reliable plasma stability during critical manufacturing steps.
  • Wafer Transfer Products
    Wafer Transfer Products
    Motion control achieves reliable wafer transfer and storage through an intelligent motion control system. High yield control is realized through excellent capacity management, particle control, vibration suppression, and motion path planning technologies. AURASKY's R&D and manufactured wafer transfer products achieve stable atmospheric and vacuum transfer control for single wafers and batches. Currently, the wafer cassette transfer and storage systems, wafer transfer systems, front-end equipment modules, and wafer transfer platforms developed and manufactured have achieved mass production and delivery at multiple clients in the semiconductor and related industries.
    • Wafer box transfer and storage system Stocker
      17c4dcc7-3a15-4c5b-bee4-6e50037b3ebe.png
      Wafer box transfer and storage system Stocker
      The stocker equipment for wafer box transfer and storage system is mainly used in the semiconductor field, acting as a buffer for wafer boxes (FOUP) in the vertical furnace production process. The stocker equipment effectively solves the problem of mismatched supply and cycle time between the vertical furnace process and upstream and downstream processes, and it also realizes the fully automatic opening and closing function of wafer boxes (FOUP), avoiding the impact of manual intervention, ensuring the clean environment of the vertical furnace production process, and improving product quality.
    • Wafer Transfer System (WTS)
      WTS(1735113710877).png
      Wafer Transfer System (WTS)
      The system interacts with the customer's OHT system to achieve Foup input and output, uses a FOUP robotic arm to transfer and store Foups between different process stages, uses an internal Loadport to open and map Foups, uses WTS to transfer, combine, and separate wafers, uses mapping at three locations to confirm wafer status and compare data, uses a fixed BF to buffer 50P wafers, and uses PTZ to hand off to the cleaning robot. The top EFU maintains a micro-clean environment for the equipment, and the top ion bar removes electrostatic residue from the transport path.
    • Equipment Front-End Module (EFEM)
      75d6e7ca-75d8-4d49-98e2-f3775b721fd8-恢复的(1733290909950).png
      Equipment Front-End Module (EFEM)
      EFEM stands for Equipment Front End Module. EFEM equipment seamlessly connects with various semiconductor process equipment (etching, PVD, CVD, cleaning equipment, etc.), ensuring automated wafer transfer and efficient wafer management in a clean environment. EFEM equipment has multiple interlocks to ensure the safety of personnel and equipment during wafer transfer.
    • Wafer Transfer Module (WTM)
      75d6e7ca-75d8-4d49-98e2-f3775b721fd8-恢复的(1733290740256).png
      Wafer Transfer Module (WTM)
      Wafer transfer platforms are an indispensable part of semiconductor process equipment. They primarily automate wafer transfer between different modules in cleanroom and vacuum environments. These platforms can quickly switch between atmospheric and vacuum states to meet system process requirements. This equipment is typically customized to meet customer process needs.

RF Control Products

Dual Output Matcher

Dual Output Matcher

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

Dual-output matchers are widely used in semiconductor equipment such as etching and thin film deposition. They match the impedance between the RF power supply and the reaction chamber in plasma equipment, maximizing RF power transmission to the reaction chamber.
Dual-frequency matcher

Dual-frequency matcher

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

A radio frequency (RF) matcher is a device used to match the impedance of the load with the impedance of the RF power source, reducing reflected power and maximizing transmitted power. Different matchers are designed to be suitable for single frequencies or multiple frequency bands to meet different application scenarios.
Single Output Matcher

Single Output Matcher

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Power semiconductor

A radio frequency (RF) matcher is a device used to match the impedance of the load with the impedance of the RF power source, reducing reflected power and maximizing transmitted power. Different matchers are designed to be suitable for single frequencies or multiple frequency bands to meet different application scenarios.
13MHz continuous wave RF power supply

13MHz continuous wave RF power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

A radio frequency (RF) power supply is a power supply device capable of generating sinusoidal waves or pulsed voltages at a fixed frequency within the RF range, with a certain power output capability. The 13MHz BG series RF power supply operates at a frequency of 13.56MHz and can output a rated power range of 1000W~5500W.
2MHz pulsed RF power supply

2MHz pulsed RF power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

2MHz BGP series RF power supply, a pulse RF power supply, operating frequency range of 1.765 MHz～2.165 MHz with frequency selection function, 50Ω load, meets the output of 2500W, 5000W rated power, power accuracy ≤±1%, composed of power supply part, RF part and control part, cooling method is water cooling and air cooling.
RPS power supply (BRT series) products

RPS power supply (BRT series) products

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

The RPS power supply is a small radio frequency power supply specifically designed for the semiconductor field, widely used in oxide and nitride cleaning processes. The RPS power supply uses analog system control and can adjust power output via a self-tuning system. Output power is collected in the form of current feedback. The power supply has a built-in power output interface that can stably output a high-voltage sine wave of 48KHz-92KHz and maintain plasma stability.
Unipolar series ESC DC power supply

Unipolar series ESC DC power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

ESC DC Power, or ESC direct current power supply, is a DC high-voltage electrostatic power supply specifically designed for electrostatic chucks (ESC). This product is a single-pole output power supply that can simultaneously provide positive and negative DC voltages. It connects to the DC electrodes of the electrostatic chuck via a dedicated cable and filter circuit, providing the high DC voltage required for the electrostatic chuck to generate suction.
Bipolar series ESC DC power supply

Bipolar series ESC DC power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

ESC DC Power, or ESC direct current power supply, is a DC high-voltage electrostatic power supply specifically designed for electrostatic chucks (ESC). This product is a bipolar output power supply that can simultaneously provide positive and negative DC voltages. It connects to the DC electrodes of the electrostatic chuck via a special cable and filter circuit, providing the high DC voltage required for the electrostatic chuck to generate suction.
13MHz pulsed RF power supply

13MHz pulsed RF power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

An RF power supply is a power supply device capable of generating sinusoidal waves or pulsed voltages at a fixed frequency, operating within the radio frequency range, and possessing a certain power output capability. The 13MHz BGP series RF power supply operates at a frequency of 13.56MHz and can output a rated power range of 1500W~6000W.
2MHz continuous wave RF power supply

2MHz continuous wave RF power supply

Semiconductor-Integrated Circuit

Semiconductor-Advanced Packaging

Semiconductor display

Semiconductor lighting

Semiconductor-Microelectromechanical Systems

Power semiconductor

Compound semiconductor

2MHz BG series RF power supply, a continuous wave RF power supply, operating frequency range of 1.765 MHz～2.165 MHz with frequency selection function, 50Ω load, meet the output 1250W, 1500W, 3000W rated power, power accuracy ≤ ±1%, composed of power supply part, RF part and control part, cooling method is water cooling and air cooling.
RF Generator
Match
DC / LF Power Supply
RF Generator
13MHz continuous wave RF power supply
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
A radio frequency (RF) power supply is a power supply device capable of generating sinusoidal waves or pulsed voltages at a fixed frequency within the RF range, with a certain power output capability. The 13MHz BG series RF power supply operates at a frequency of 13.56MHz and can output a rated power range of 1000W~5500W.
2MHz pulsed RF power supply
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
2MHz BGP series RF power supply, a pulse RF power supply, operating frequency range of 1.765 MHz～2.165 MHz with frequency selection function, 50Ω load, meets the output of 2500W, 5000W rated power, power accuracy ≤±1%, composed of power supply part, RF part and control part, cooling method is water cooling and air cooling.
RPS power supply (BRT series) products
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
The RPS power supply is a small radio frequency power supply specifically designed for the semiconductor field, widely used in oxide and nitride cleaning processes. The RPS power supply uses analog system control and can adjust power output via a self-tuning system. Output power is collected in the form of current feedback. The power supply has a built-in power output interface that can stably output a high-voltage sine wave of 48KHz-92KHz and maintain plasma stability.
13MHz pulsed RF power supply
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
An RF power supply is a power supply device capable of generating sinusoidal waves or pulsed voltages at a fixed frequency, operating within the radio frequency range, and possessing a certain power output capability. The 13MHz BGP series RF power supply operates at a frequency of 13.56MHz and can output a rated power range of 1500W~6000W.
2MHz continuous wave RF power supply
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
2MHz BG series RF power supply, a continuous wave RF power supply, operating frequency range of 1.765 MHz～2.165 MHz with frequency selection function, 50Ω load, meet the output 1250W, 1500W, 3000W rated power, power accuracy ≤ ±1%, composed of power supply part, RF part and control part, cooling method is water cooling and air cooling.
Match
Dual Output Matcher
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
Dual-output matchers are widely used in semiconductor equipment such as etching and thin film deposition. They match the impedance between the RF power supply and the reaction chamber in plasma equipment, maximizing RF power transmission to the reaction chamber.
Dual-frequency matcher
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Compound semiconductor
A radio frequency (RF) matcher is a device used to match the impedance of the load with the impedance of the RF power source, reducing reflected power and maximizing transmitted power. Different matchers are designed to be suitable for single frequencies or multiple frequency bands to meet different application scenarios.
Single Output Matcher
Semiconductor-Integrated Circuit
Semiconductor-Advanced Packaging
Semiconductor display
Semiconductor lighting
Semiconductor-Microelectromechanical Systems
Power semiconductor
Power semiconductor
A radio frequency (RF) matcher is a device used to match the impedance of the load with the impedance of the RF power source, reducing reflected power and maximizing transmitted power. Different matchers are designed to be suitable for single frequencies or multiple frequency bands to meet different application scenarios.

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